Published

Materials Science

Investigation of Rechtschaffner and Doehlert approches to elaborate the NiFe2O4 thin film

Published on - Chemical Physics Letters

Authors: N. Hosni, W. Selmi, Karim Zehani, Frédéric Mazaleyrat, H. Maghraoui-Meherzi

See the publication on HAL DOI

Highlights • Experimental design methodology has been applied to investigate the influence of the principal experimental parameters on saturation magnetization. • Optimal condition of NiFe2O4 thin film has been investigated by Doehlert matrix. • The obtained NiFe2O4 thin film was elaborated by chemical bath deposition. • Electrochemical properties of NiFe2O4 thin film have been investigated in 1M NaOH aqueous electrolyte.