Electronics

Exploring the Limits of Vacuum Casting Technique for Micron and Submicron Features

Published on - Proc. of Solid Freeform Symposium

Authors: Matthieu Denoual, Pascal Mognol, Bruno Le Pioufle

A study of resolution limits in standard rapid prototyping vacuum cast molding processes and adaptation of this technique to reach subm icron accuracy is proposed. Micro-fabrication technologies are used to fabricate micron a nd submicron high aspect-ratio patterns on the original parts. The molding of the original part s is optimized to allow replication of submicron features. In carefully exploring materials a nd surface treatments, cast parts are successfully replicated with submicron and high aspect ratio micron structures. These encouraging results enable the use of such processes for micro- and nano-systems applications and open the door to development and production of low cost, high resolution biochips.