Investigation of Rechtschaffner and Doehlert approches to elaborate the NiFe2O4 thin film

The influence of the experimental parameters and their interactions on saturation magnetization (Ms) of NiFe2O4 thin films have been determined by the experimental design methodology. The saturation magnetization (Ms) is very influenced by the deposition and annealing temperature, which are proved by Rechtschaffner design. The optimal condition of the NiFe2O4 thin film has been predict by Doehlert matrix. The structure and the phase identification of the prepared NiFe2O4 thin film under optimal condition were determining by XRD, FTIR and Raman. The SEM analysis has revealed the flower-like structure of the NiFe2O4 thin film. The ferrimagnetic behavior of the NiFe2O4 thin film has been determining by VSM measurement. The saturation magnetization (Ms = 0.49 T) is in agree with Ms (0.48 T) predict by Rechtschaffner design. The double-layer capacitance (EDLC) of NiFe2O4 has been investigating by cyclovoltammetry, which show a semi-rectangular shape in the negative and positive potential. The electrochemical impedance spectroscopy has confirmed the resistance behavior of the NiFe2O4 electrode.